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lithography (NIL) is useful technique because of its low cost and high throughput capabilityfor the fabrication of sub-micrometer paterns which has potential applications in micro-optics, magnetic memorydevices, bio sensors, and photonic crystals. Usually, a chemical surface treatment of the stamp is needed to ensure aclean release after imprinting and to protect the expensive original master against contamination. Meanwhile, adhesionpromoter betwen resin and substrate is also important in the nanoscale pattern. In this work, we have investigated theeffect of surface treatment using silane coupling agent as release layer and adhesion promoter for UV-Nanoimprintlithography. Uniform SAM (self-assembled monolayer) could be fabricated by vapor deposition method. Vapor phaseprocess eliminates the use of organic solvents and greatly simplifies the handling of the sample. It was also proven that3-acryloxypropyl methyl dichlorosilane (APMDS) could strongly improve the adhesion force betwen resin and sub-strate compared with common planarization layer such as DUV-30J or oxygen plasma treatment.