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Ti-indiffused LiNbO3 waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO3 dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO3 dry etching after waveguide patterning for optical modulation by using neutral loop discharge (NLD) plasma.